laser-producedplasmas相关论文
Extreme ultraviolet (EUV) lithography at a wavelength of 13.5 nm is expected to be the promising technology for semicond......
描述了用于激光等离子体软X射线光谱学研究的长波晶体谱仪。用具有大晶格常数的晶体(PHM,2d=6.35 nm),极薄的滤片和对软X射线灵敏的底......
Interactions of two counter-streaming plasmas driven by high power laser pulses are studied on Shenguang II laser facili......